Technical Reports

HPL-2012-6

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Nanoimprint Lithography with≤60 nm Overlay Precision

Wu, Wei; Walmsley, Robert G.; Li, Wen-Di; Li, Xuema; Williams, R. Stanley
HP Laboratories

HPL-2012-6

Keyword(s): nanoimprint; overlay; lithography

Abstract: Nanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of≤60 nm.

17 Pages

External Posting Date: January 6, 2012 [Fulltext]. Approved for External Publication
Internal Posting Date: January 6, 2012 [Fulltext]

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