Electron Energy-Loss Spectroscopy Study of NbOx Film for Resistive Memory Applications
Share- Author(s): Zhang, jiaming; Norris, Kate; Samuels, Katy; Ge, Ning; Zhang, Max; Park, Joonsuk; Sinclair, Robert; Gibson, Gary; Yang, J. Joshua; Li, Zhiyong; Williams, R. Stanley
- HP Laboratories
- HPL-2015-14
- Keyword(s):
Abstract:
2 Pages
- External Posting Date: External Posting Date: March 6, 2015 [Abstract Only]. Approved for External Publication - External Copyright Consideration
- Internal Posting Date: Internal Posting Date: March 6, 2015 [Fulltext]